Redeposition of sputtered species by the electric fields of an incident ion beam and sputtered ion

Autor:	H.F. Helbig, A. C. Miller, P.J. Adelmann, A. W. Czanderna
Rok vydání:	1976
Předmět:	Secondary ion mass spectrometry Ion beam deposition Ion beam Ion beam mixing Physics::Plasma Physics Chemistry Sputtering General Engineering Atomic physics Ion gun Focused ion beam Ion
Zdroj:	Journal of Vacuum Science and Technology. 13:379-383
ISSN:	0022-5355
DOI:	10.1116/1.568894
Popis:	To explain the recently observed redeposition of sputtered Au, Ag, and Cu, it is shown here that low energy ions sputtered from a plane metallic surface by an obliquely incident ion beam can be returned to the surface by the electrostatic fields of the beam and of the image charges of the sputtered ions. Trajectories for sputtered Au ions were obtained by numerical integration of the equations of motion. The ion image force dominates the motion near the plane (
Databáze:	OpenAIRE
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