Post Dry-Etch Cleaning Issues of an Organic Low-K Dielectric

Autor:	Carine Alaerts, Filip Lanckmans, Karen Maex, Mikhail R. Baklanov, S. Vanhaelemeersch
Rok vydání:	1998
Předmět:	Residue (chemistry) Materials science Chemical engineering Environmental chemistry Low-k dielectric General Materials Science Dry etching Condensed Matter Physics Atomic and Molecular Physics and Optics
Zdroj:	Solid State Phenomena. :89-92
ISSN:	1662-9779
DOI:	10.4028/www.scientific.net/ssp.65-66.89
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::ec10f4bb0bf65d8f93af2df9a3769cec https://doi.org/10.4028/www.scientific.net/ssp.65-66.89 Zobrazit plný text záznamu