Superhydrophobic Patterned Film Fabricated from DNA Assembly and Ag Deposition
| Autor: | Shuo Bai, Dunshen Zhu, Er-Qiang Chen, Weixiao Cao, Zhifeng Zhang, Zhaohui Yang, Linglu Yang, Maofeng Zhang |
|---|---|
| Rok vydání: | 2006 |
| Předmět: |
Nanostructure
Materials science Nanotechnology Microstructure Chloride Surfaces Coatings and Films Electronic Optical and Magnetic Materials Contact angle chemistry.chemical_compound General Energy chemistry medicine Surface modification Physical and Theoretical Chemistry Deposition (law) Ag deposition Acrylic acid medicine.drug |
| Zdroj: | The Journal of Physical Chemistry C. 111:431-434 |
| ISSN: | 1932-7455 1932-7447 |
| DOI: | 10.1021/jp065407q |
| Popis: | In this article we obtained a superhydrophobic patterned Ag film mainly by two steps. The first step is to fabricate a DNA film pattern through poly(dimethyldiallylammonium chloride) alternate deposition with DNA on a latent imaging film formed by the selective UV exposure of a photosensitive diazoresin/poly(acrylic acid) self-assembly (SA) film. The second step is to build up the patterned Ag film on a DNA film pattern with Ag electroless deposition. After surface modification with n-dodecanethiol the patterned Ag film, which exhibits obvious microstructures and nanostructures, will possess superhydrophobic properties and the contact angle can reach ∼162°. |
| Databáze: | OpenAIRE |
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