| Autor: |
Chris Magg, Ray Jeffer, Neal Caldwell, Michael J. Trybendis, Monica Barrett, Michael J. Lercel, Kevin W. Collins, Lucien Bouchard |
| Rok vydání: |
2000 |
| Předmět: |
|
| Zdroj: |
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 18:3210 |
| ISSN: |
0734-211X |
| Popis: |
Masks for electron projection lithography (EPL) require the use of thin membranes for either stencil or all membrane scattering masks. The processes of forming the printable patterns before or after the membrane etch step are compared for EPL stencil masks. Image size uniformity and image placement distortions are characterized and indicate, with appropriate process optimization, either process flow is viable for EPL mask manufacture. Image size uniformity within individual membranes has achieved |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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