Influence of interdiffusion on the magnetic properties of Co/Si (100) films after high magnetic field annealing

Autor:	Guojian Li, Qiang Wang, Changsheng Lou, Hongxuan Pang, Kai Wang, Yue Zhao, Jicheng He
Rok vydání:	2015
Předmět:	Condensed Matter::Soft Condensed Matter Condensed Matter::Materials Science Nuclear magnetic resonance Materials science Condensed matter physics Annealing (metallurgy) Magnetic phase Thin film Condensed Matter Physics High magnetic field Electronic Optical and Magnetic Materials Magnetic field
Zdroj:	Journal of Magnetism and Magnetic Materials. 387:6-12
ISSN:	0304-8853
DOI:	10.1016/j.jmmm.2015.03.080
Popis:	The influence of interdiffusion on the magnetic properties of Co/Si (100) films after thermal annealing in the presence of a strong magnetic field was investigated. The interdiffusion coefficients of films that were annealed at temperatures of 380 °C and 420 °C in the presence of high magnetic fields were not affected. However, the interdiffusion coefficient of films annealed at 400 °C in the presence of a high magnetic field decreased significantly. The change in the interdiffusion coefficient, caused by high magnetic field annealing, increased the content of the magnetic phase. This increase in the magnetic phase improved the saturation magnetization. A new method of high magnetic field annealing is presented that can modulate the diffusion and magnetic properties of thin films.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::eab6195d52b26aa372c450c75a9c9ba9 https://doi.org/10.1016/j.jmmm.2015.03.080 Zobrazit plný text záznamu Full Text from ScienceDirect