Block Copolymer Orientation Control Using a Top-Coat Surface Treatment
| Autor: | Michael J. Maher, Julia D. Cushen, Christopher J. Ellison, C. Grant Willson, Christopher M. Bates, Takehiro Seshimo, Leon M. Dean, William J. Durand |
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| Rok vydání: | 2012 |
| Předmět: |
Directed self assembly
chemistry.chemical_classification Materials science Polymers and Plastics Annealing (metallurgy) business.industry Organic Chemistry High resolution Nanotechnology Polymer Surface energy Orientation control chemistry Materials Chemistry Perpendicular Copolymer Optoelectronics business |
| Zdroj: | Journal of Photopolymer Science and Technology. 25:125-130 |
| ISSN: | 1349-6336 0914-9244 |
| DOI: | 10.2494/photopolymer.25.125 |
| Popis: | Directed self-assembly of Si containing block copolymers (BCP) is a candidate for next generation patterning technology because it enables both high resolution and high etch contrast. Achieving high resolution requires a high χ parameter. However, it is often difficult to achieve perpendicular patterns by t hermal annealing of BCPs with a lower surface energy block, which tends to align with the air interface. New top surface treatment materials that provide a surface energy between those of the blocks have been developed that enable perpendicular pattern alignment with block copolymers that have a low surface energy block. Keyword: Top-coat, directed self assembly, Si-containing block copolymer |
| Databáze: | OpenAIRE |
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