Generating Large Magnetic Field in a High Resolution Electron Beam Lithography
| Autor: | P. Guo, X. Y. Sun, C. H. Wan, X. F. Han, R. Jede, T. Kliem, Qian Zhang, A. Rudzinski |
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| Rok vydání: | 2015 |
| Předmět: | |
| Zdroj: | Microscopy and Microanalysis. 21:1049-1050 |
| ISSN: | 1435-8115 1431-9276 |
| DOI: | 10.1017/s1431927615006042 |
| Popis: | In this talk we will report about first results and measurements achieved with an electron beam lithographic system (EBL, eLINE Plus CAS) containing a unique in situ setup to not only fabricate but also characterize and measure GMR/TMR based devices. The eLINE Plus CAS is additionally equipped with the capability of generating a large lateral magnetic field, which is indispensible in measurement of spintronic devices or materials, besides of its original SEM and EBL functionalities. This unique EBL instrument, thus, could be not only used as a microscope or a lithography system but also as a analytical instrument for in-situ magnetoelectric transport measurements. Figure 1 shows the structure of the magnet in chamber whose pole tips are placed underneath pole piece of SEM column. The maximum lateral field realized at current stage is about 400 Oe as exciting current is elevated as 2.5 A. This large field has already been applied in in-situ measurement GMR or TMR devices. As shown in Figure 2, utilizing the magnet as well as the other two tungsten probers already installed in the chamber, we have measured magnetotransport properties of a TMR device whose TMR ratio is nearly the same as that measured outside chamber. We will further report about the characterization of the homogeneity of the magnetic field and next steps taken in this project. |
| Databáze: | OpenAIRE |
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