HIPIMS ITO films from a rotating cylindrical cathode
| Autor: | A. Sabelfeld, Günter Bräuer, H. Gerdes, Michael Vergöhl, Ralf Bandorf, F.C. Carreri |
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| Rok vydání: | 2016 |
| Předmět: |
Materials science
02 engineering and technology 01 natural sciences law.invention Electric arc law 0103 physical sciences Materials Chemistry Electronic engineering Ceramic Thin film 010302 applied physics business.industry Surfaces and Interfaces General Chemistry Sputter deposition 021001 nanoscience & nanotechnology Condensed Matter Physics Cathode Nanocrystalline material Surfaces Coatings and Films Indium tin oxide visual_art visual_art.visual_art_medium Optoelectronics High-power impulse magnetron sputtering 0210 nano-technology business |
| Zdroj: | Surface and Coatings Technology. 290:65-72 |
| ISSN: | 0257-8972 |
| DOI: | 10.1016/j.surfcoat.2015.10.069 |
| Popis: | High power impulse magnetron sputtering (HIPIMS) allows the deposition of thin films from plasmas with high metallic ion content. For several applications, indium tin oxide (ITO) films were successfully deposited by HIPIMS from planar ceramic targets, e.g. for ice-free windshields or shaped glass tubes. These films present good conductivity as well as high wear resistance, derived from their nanocrystalline structure. With respect to industrial implementation, the use of rotatable cylindrical cathodes as a promising alternative due to their many advantages like better material utilization, longer durability, or reduced arcing is studied. In this work, ITO films were produced from a rotating cylindrical cathode by HIPIMS and DC magnetron sputtering. The influence of process parameters (average power, voltage, peak current and pressure) on the resulting film properties was investigated. All depositions were performed at room temperature, followed by annealing steps. Electrical and optical properties were analyzed and the process stability investigated. Highly transparent films were obtained with resistivity between 300 and 400 μΩ cm. |
| Databáze: | OpenAIRE |
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