| Autor: |
Tsuneo Terasawa, Ichiro Mori, Soichi Inoue, Haruhiko Kusunose, Kiwamu Takehisa, Tomohiro Suzuki, Hiroki Miyai, Hidehiro Watanabe, Anna Tchikoulaeva, Takeshi Yamane |
| Rok vydání: |
2013 |
| Předmět: |
|
| Zdroj: |
Extreme Ultraviolet (EUV) Lithography IV. |
| ISSN: |
0277-786X |
| DOI: |
10.1117/12.2011776 |
| Popis: |
The availability of actinic blank inspection is one of the key milestones for EUV lithography on the way to high volume manufacturing. Placed at the very beginning of the mask manufacturing flow, blank inspection delivers the most critical data set for the judgment of the initial blank quality and final mask performance. From all actinic metrology tools proposed and discussed over the last years, actinic blank inspection (ABI) tool is the first one to reach the pre-production status. In this paper we give an overview of EIDEC-Lasertec ABI program, provide a description of the system and share the most recent performance test results of the tool for 16 nm technology node. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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