Comments on '1.88-$\hbox{m}\Omega \cdot \hbox{cm}^{2}$ 1650-V Normally on 4H-SiC TI-VJFET
Autor: | V Veliadis |
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Rok vydání: | 2010 |
Předmět: | |
Zdroj: | IEEE Transactions on Electron Devices. 57:3540-3543 |
ISSN: | 1557-9646 0018-9383 |
Popis: | The discussion section of paper “1.88-mΩ·cm2 1650-V Normally on 4H-SiC TI-VJFET” which appeared in IEEE Transactions on Electron Devices, vol. 55, no. 8, August 2008, offers a comparative analysis between TI-VJFETs fabricated at USCI/Rutgers and VJFETs (SITs) fabricated at Northrop Grumman Electronic Systems (NGES) for power switching applications. I have a number of issues with this analysis which I wish to highlight. In addition, this paper claims VJFET performance records, which are dubious as they are based on on-resistance values obtained under bipolar operation and on blocking-voltages quoted at unspecified drain-current densities. |
Databáze: | OpenAIRE |
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