Interface Reactions and Diffusion of Si3N4 / Ti and Si3N4 / TiAl Alloys

Autor:	Kwang Su Choi, Jong Won Lee, Sun Jin Kim, Ji Eun Lee, Joon Sik Park
Rok vydání:	2017
Předmět:	Interfacial reaction Materials science Diffusion Diffusion pathway Kinetics chemistry.chemical_element Diffusion layer Chemical engineering chemistry visual_art Melting point visual_art.visual_art_medium General Materials Science Ceramic Tin
Zdroj:	Korean Journal of Materials Research. 27:603-608
ISSN:	2287-7258 1225-0562
Popis:	Si3N4 is a ceramic material attracting attention in many fields because of its excellent abrasion resistance. In addition, Ti and TiAl alloys are metals used in a variety of high temperature environments, and have attracted much attention because of their high strength and high melting points. Therefore, study of the interface reaction between Si3N4 / Ti and Si3N4 / TiAl can be a useful practice to identify phase selection and diffusion control. In this study, Si3N4 / Ti5Si3 + TiN / TiN / Ti diffusing pairs were formed in the Si3N4 / Ti interfacial reaction and Si3N4 / TiN(Al) / Ti3Al / TiAl diffusion pathway was identified in the Si3N4 / TiAl interfacial reaction. The diffusion layers of the interface reactions were identified and, to investigate the kinetics of the diffusion layer, the integrated diffusion coefficients were estimated.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::ea260db6351c8f7af3ae3f4d6df4568e https://doi.org/10.3740/mrsk.2017.27.11.603 Zobrazit plný text záznamu