Interface Reactions and Diffusion of Si3N4 / Ti and Si3N4 / TiAl Alloys
Autor: | Kwang Su Choi, Jong Won Lee, Sun Jin Kim, Ji Eun Lee, Joon Sik Park |
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Rok vydání: | 2017 |
Předmět: | |
Zdroj: | Korean Journal of Materials Research. 27:603-608 |
ISSN: | 2287-7258 1225-0562 |
Popis: | Si3N4 is a ceramic material attracting attention in many fields because of its excellent abrasion resistance. In addition, Ti and TiAl alloys are metals used in a variety of high temperature environments, and have attracted much attention because of their high strength and high melting points. Therefore, study of the interface reaction between Si3N4 / Ti and Si3N4 / TiAl can be a useful practice to identify phase selection and diffusion control. In this study, Si3N4 / Ti5Si3 + TiN / TiN / Ti diffusing pairs were formed in the Si3N4 / Ti interfacial reaction and Si3N4 / TiN(Al) / Ti3Al / TiAl diffusion pathway was identified in the Si3N4 / TiAl interfacial reaction. The diffusion layers of the interface reactions were identified and, to investigate the kinetics of the diffusion layer, the integrated diffusion coefficients were estimated. |
Databáze: | OpenAIRE |
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