Structures, morphologies, and chemical states of sputter-deposited CrZrN thin films with various Zr contents

Autor: C. Chantharangsi, Somyod Denchitcharoen, Surasing Chaiyakun, Pichet Limsuwan
Rok vydání: 2015
Předmět:
Zdroj: Thin Solid Films. 589:613-619
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2015.06.045
Popis: Chromium zirconium nitride (CrZrN) thin films were prepared on Si wafers and glasses at various Zr contents by reactive DC magnetron co-sputtering of Cr and Zr metals in Ar and N 2 mixture without voltage biasing and external heating. Influences of the Zr contents on crystal structure, cross-section morphology, surface morphology, and chemical composition and chemical state were investigated by X-ray diffraction, field emission scanning electron microscopy, atomic force microscopy, and X-ray photoelectron spectroscopy, respectively. The results showed that N content in the films was increased when Zr content increased. Film microstructure changed from coarse columnar to finer-grain morphology and film surface became smooth caused by grain refinement. Zr–metal and Zr–N bonding fractions were increased with the increasing Zr content, whereas Cr–N was decreased due to being substituted by Zr of Cr atoms in the fcc B1 type crystal structure of (Cr, Zr)N. In addition to an increase in lattice parameter, the substitution of Zr could lead to an increase in interatomic distances which affected bonding length between metals and nitrogen atoms. According to the charge potential model, the increase in bonding distances between atoms resulted in negative shifts in binding energy of electrons of all elements that led to observation of lowering in the separation between photoelectron lines of Cr, Zr, and N elements. The lower separation with the increase of Zr content suggested that bonding between metals and nitrogen became stronger due to the dominance of the covalent character as evidenced by the enhanced hardness of the CrZrN materials.
Databáze: OpenAIRE
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