Contact end resistance test structure applied for nanocontact measurements
| Autor: | Xavier Borrisé, Joaquin Santander, Carles Cané, Gemma Rius, Iñigo Martin-Fernandez |
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| Rok vydání: | 2012 |
| Předmět: |
Interconnection
Materials science business.industry Contact resistance Structure (category theory) Mechanical engineering Nanotechnology Condensed Matter Physics Atomic and Molecular Physics and Optics Line (electrical engineering) Surfaces Coatings and Films Electronic Optical and Magnetic Materials Characterization (materials science) Electrical resistivity and conductivity Microelectronics Electrical and Electronic Engineering business Ohmic contact |
| Zdroj: | Microelectronic Engineering. 99:18-22 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/j.mee.2012.05.013 |
| Popis: | Graphical abstractDisplay Omitted Highlights? An accurate method to characterize nanoobject-metal line contacts is presented. ? The contact end resistance test structure is adapted from microelectronics. ? The measurement of an individual nanocontact is allowed. ? Contact resistivity allows prediction of contact resistance for any contact size. This paper presents an accurate method and test structure to evaluate ohmic nanocontacts. The procedure permits the characterization of the contact resistance between standard-in-microtechnology interconnect lines and a certain nanoscaled-in-width object. It is based on the adaption of the classic contact end resistance structure used for the measurement of the contact end resistance in microelectronic technologies. After the theoretical model study, the methodology is validated for the single-walled carbon nanotube case. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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