Selective etching of fs-laser written structures in Y3Al5O12
| Autor: | Christian Kränkel, Kore Hasse, Thomas Calmano |
|---|---|
| Rok vydání: | 2017 |
| Předmět: |
Materials science
Fabrication business.industry 02 engineering and technology Surface finish 021001 nanoscience & nanotechnology Laser 01 natural sciences Isotropic etching law.invention 010309 optics Optics Etching (microfabrication) law 0103 physical sciences Optoelectronics Photonics Reactive-ion etching 0210 nano-technology business Selectivity |
| Zdroj: | 2017 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC). |
| DOI: | 10.1109/cleoe-eqec.2017.8087278 |
| Popis: | We present a detailed study on selective chemical etching of fs-laser modified single crystalline Y 3 Al 5 O 12 (YAG) toward the fabrication of microchannels for micro- and optofluidic as well as photonic applications. The precise knowledge of parameters such as the etching rate, selectivity and roughness of the etched surfaces is essential for this purpose. In particular their dependence on structuring parameters, such as pulse energy and translation velocity as well as etching parameters, such as agent and temperature needs to be determined. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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