A comprehensive solution for BEOL variation characterization and modeling
| Autor: | Ke-Ying Su, Te-Yu Liu, Chung-Kai Lin, King-Ho Tam, Min-Chie Jeng, Cheng Tai-Yu, Kevin Chen, Cheng Hsiao, Jun-Fu Huang, Ke-Wei Su, Kuo-Pei Lu, Joshua Sun, Chun Cheng, Katherine Chiang |
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| Rok vydání: | 2016 |
| Předmět: |
010302 applied physics
Optimal design Engineering business.industry Monte Carlo method Semiconductor device modeling Statistical model 02 engineering and technology 01 natural sciences 020202 computer hardware & architecture Back end of line Margin (machine learning) 0103 physical sciences 0202 electrical engineering electronic engineering information engineering Electronic engineering business Front end of line Scaling |
| Zdroj: | 2016 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD). |
| DOI: | 10.1109/sispad.2016.7605208 |
| Popis: | A comprehensive variation model is critical to achieve both competitive design and manufacturing yield in advanced technologies. Conventionally, as long as FEOL (front end of line) statistical model is appropriate, BEOL (back end of line) variations given by lumping multiple variation sources into few corners is enough to achieve reliable simulation results. However, as BEOL contribution is becoming more important with device scaling, simulation results with conventional corner model may not always produce optimal design margin. We thus propose a more comprehensive solution for BEOL variations characterization and modeling associated with statistical Monte Carlo simulation. |
| Databáze: | OpenAIRE |
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