| Autor: |
T. Chomicz, Bruce W. Smith, K.H. Hesler, Lynn Fuller |
| Rok vydání: |
2003 |
| Předmět: |
|
| Zdroj: |
Proceedings., Eighth University/Government/Industry Microelectronics Symposium. |
| Popis: |
Describes the topics covered by Microlithography I and II laboratories and the Advanced Microelectronic Chemistry Laboratory at the Rochester Institute of Technology. Involvement in Microlithography I lab introduces the students to photoresist application and measurement experiments, radiometric characteristics of photolithographic systems. optical exposure and overlay methods, linewidth measurement, and image evaluation using a scanning electron microscope. Microlithography II lab introduces the students to some advanced state-of-the-art lithography techniques being used in IC fabrication at the micrometer and submicrometer levels. Advanced Microlithography introduces the students to the characteristics of image formation and image recording and their matching for optimum performance. > |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
|
