The new diamond technology and its application in cutting tools
| Autor: | P.M. Stephan, C.D. Dean, R.A. Hay |
|---|---|
| Rok vydání: | 1992 |
| Předmět: |
Materials science
Cutting tool Silicon Mechanical Engineering Abrasive Metallurgy Diamond chemistry.chemical_element General Chemistry Chemical vapor deposition engineering.material Electronic Optical and Magnetic Materials chemistry.chemical_compound chemistry Machining Tungsten carbide Materials Chemistry engineering End mill Electrical and Electronic Engineering |
| Zdroj: | Diamond and Related Materials. 1:710-716 |
| ISSN: | 0925-9635 |
| DOI: | 10.1016/0925-9635(92)90196-u |
| Popis: | Thick-film and thin-film chemical vapor deposition (CVD) cutting tool inserts and end mills were tested in turning and milling applications on high silicon alloys and composite materials against sintered diamond and tungsten carbide tools. Flank wear measurements and scanning electron microscopy were used to characterize the cutting tool performance. In general, CVD thick-film diamond exhibits better wear resistance and comparable impact resistance to sintered diamond as cutting tool inserts and far better wear resistance than tungsten carbide in end mill applications. Thin-film diamond tools also show considerable improvement in wear life over tungsten carbide inserts and end mills in machining abrasive materials. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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