Direct writing of thin and thick metal films via micro glow plasma scanning
| Autor: | Zhiming Xiao, Anindya Lal Roy, Kenichi Takahata, Ahmed M. Abdul-Wahed |
|---|---|
| Rok vydání: | 2016 |
| Předmět: |
010302 applied physics
Materials science Silicon Atmospheric pressure Microplasma business.industry Doping Analytical chemistry chemistry.chemical_element 02 engineering and technology Substrate (electronics) 021001 nanoscience & nanotechnology 01 natural sciences chemistry Sputtering 0103 physical sciences Electrode Deposition (phase transition) Optoelectronics 0210 nano-technology business |
| Zdroj: | 2016 IEEE 29th International Conference on Micro Electro Mechanical Systems (MEMS). |
| Popis: | This paper presents the first micro-scale process for local deposition and direct writing of metal films through sputtering of a micromachined target electrode. The deposition process is achieved via a highly confined micro glow plasma generated between the electrode's tip and the substrate at atmospheric pressure. Using cylindrical copper electrodes with diameters down to 40 μm, a micro glow is stably established to show local deposition of the material on doped silicon. The controlled manipulation of microplasma enables direct writing of the target material, for thicknesses ranging from the 100-nm order to over 5 μm variable with the discharge and scanning conditions. The feasibility of non-planar patterning is also demonstrated. The process is promising for rapid and low-cost production of thin-film patterns and possibly thick three-dimensional microstructures. |
| Databáze: | OpenAIRE |
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