Thin-film optimization strategy in high numerical aperture optical lithography, part 1: principles
| Autor: | Chun-Kuang Chen, Chih-Ming Ke, Anthony Yen, Yao-Ching Ku, Shinn-Sheng Yu, Bang-Ching Ho, Hong-Chang Hsieh, Jacky Huang, T. S. Gau, Burn Jeng Lin |
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| Rok vydání: | 2005 |
| Předmět: |
Materials science
business.industry Mechanical Engineering Condensed Matter Physics Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials law.invention Optics Reflection (mathematics) Resist Stack (abstract data type) law Optoelectronics X-ray lithography Electrical and Electronic Engineering Photolithography Thin film business Critical dimension Lithography |
| Zdroj: | Journal of Micro/Nanolithography, MEMS, and MOEMS. 4:043003 |
| ISSN: | 1932-5150 |
| Popis: | The functional dependence of a resist critical dimension (CD) with respect to resist thickness for a general absorptive thin-film stack in the case of oblique incidence is derived analytically with the rigorous electromagnetic theory. Based on obtained results, we discuss those thin-film effects related to CD control, such as the swing effect, bulk effect, etc., especially in the regime of high numerical aperture optical lithography. |
| Databáze: | OpenAIRE |
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