Prediction of Pressure Dependent Rate Constant for the Reaction, SiH4(g)→SiH3(g)+H(g), Using RRKM Theory Aided by Ab-Initio MO

Autor:	Takahiro Ishizaki, Nagahiro Saito, Akio Fuwa, Mitsuhito Hirota
Rok vydání:	1999
Předmět:	RRKM theory Materials science Metals and Alloys Ab initio Pressure dependent Chemical vapor deposition Condensed Matter Physics Silane chemistry.chemical_compound Reaction rate constant chemistry Mechanics of Materials Materials Chemistry Physical chemistry
Zdroj:	Journal of the Japan Institute of Metals. 63:520-526
ISSN:	1880-6880 0021-4876
DOI:	10.2320/jinstmet1952.63.4_520
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::e91fd6a1941bce23e294e15a37af44c2 https://doi.org/10.2320/jinstmet1952.63.4_520 Zobrazit plný text záznamu