Integration of fine-pitched Through-Silicon Vias and Integrated Passive Devices

Autor: Dzafir Shariff, Aung Kyaw Oo, Lily Asoy, Keith Buchanan, Chia Lai Yee, Steve Burgess, Pandi C. Marimuthu, Kath Crook, Tony Wilby, Ken Hsiao
Rok vydání: 2011
Předmět:
Zdroj: 2011 IEEE 61st Electronic Components and Technology Conference (ECTC).
Popis: This paper reports on a silicon interposer containing both Through-Silicon Vias [TSV] and Integrated Passive Devices [IPD]. The fine-pitched 30μm diameter × 100μm deep TSV connect the IPD on one side of the wafer with Re-Distribution Layer [RDL] metallization and solder bumps on the other. Such a platform provides great versatility for heterogeneous system integration and reduced form-factor packaging. Interposer manufacture is described and performance of integrated RF filters and resonators is assessed after reliability testing, including; high temperature stress, thermal cycling and accelerated stress test.
Databáze: OpenAIRE