Autor: |
Xu An Pei, Yong Liang Tan, Zhen Guo Song, Ti Ning, Jin Ma, Feng Ji |
Rok vydání: |
2009 |
Předmět: |
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Zdroj: |
Advanced Materials Research. :759-762 |
ISSN: |
1662-8985 |
DOI: |
10.4028/www.scientific.net/amr.79-82.759 |
Popis: |
1-12% {atomic ratio of In/(In+Sn)} indium-doped tin oxide (SnO2:In) films were successfully prepared on sapphire substrates by MOCVD method. HRTEM image showed that the obtained films were single crystalline films. The X-ray photoelectron spectroscopy showed the existence of non-stoichiometric oxide on the film surface. The Hall mobility and carrier concentration of the SnO2:In films varied with the In content increasing. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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