Negative Tone Imaging Process and Materials for EUV Lithography

Autor:	Wataru Nihashi, Shuuji Hirano, Shinji Tarutani, Natsumi Yokokawa, Hiroo Takizawa
Rok vydání:	2013
Předmět:	Materials science Polymers and Plastics business.industry Extreme ultraviolet lithography Organic Chemistry Resolution (electron density) Process (computing) Material Design Tone (musical instrument) Resist Materials Chemistry Optoelectronics Sensitivity (control systems) business Aerial image
Zdroj:	Journal of Photopolymer Science and Technology. 26:599-604
ISSN:	1349-6336 0914-9244
Popis:	The advantages of NTI process in EUV is demonstrated by optical simulation method for 0.25NA and 0.33NA illumination system with view point of optical aerial image quality and photon density. The extendabLlity of NTI for h igher NA system is considered for further tight pitch and small size contact hole imaging capability. Process and material design strategy to NTI were discussed with consideration on comparison to ArF NTI process and materials, and challenges in EUV materials dedicated to NTI process were discussed as well. A new polymer was well designed for EUV-NTD process, and the resists formulated with the new polymer demonstrated good advantage of resolution and sensitivity in isolated trench imaging, and 24 nm half pitch resolution at dense C/H, with 0.3NA MET tool.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::e8d07f6f0137dcafe2f116cf09ae83d7 https://doi.org/10.2494/photopolymer.26.599 Zobrazit plný text záznamu