Multilayer AIN/AlGaN/GaN/AlGaN heterostructures with quantum wells for high-power field-effect transistors grown by ammonia MBE

Autor: S. B. Aleksandrov, M. V. Stepanov, Yu. V. Pogorel’skiĭ, M. Yu. Pogorel’skiĭ, L. É. Velikovskiĭ, I. É. Velikovskiĭ, S. I. Petrov, A. P. Shkurko, M. A. Sokolov, A. É. Byrnaz, D. M. Krasovitskiĭ, M. V. Pavlenko, A. V. Veretekha, A. N. Alekseev, V. P. Chalyĭ, A. G. Tkachenko, I. A. Sokolov
Rok vydání: 2006
Předmět:
Zdroj: Technical Physics Letters. 32:960-963
ISSN: 1090-6533
1063-7850
DOI: 10.1134/s1063785006110162
Popis: High-power field-effect transistors (FETs) are among the main applications of heterostructures based on group III metal nitrides, which in most cases implement the classical GaN/AlGaN structure with a single junction. An alternative approach based on the use of double heterostructures with imporved two-dimensional electron gas (2DEG) confinement offers a number of advantages, but such structures are usually characterized by a lower carrier mobility and density (in GaN layers of reduced thickness) as compared to the values in the single-junction structures. Optimization of the heterostructure design and ammonia MBE growth conditions allowed us to obtain multilayer AlN/AlGaN/GaN/AlGaN heterostructures with quantum wells, which are characterized by a 2DEG carrier mobility of 1100–1300 cm2/(V s) and a sheet electron density of (1.1–1.3) × 1013 cm-2. Experimental FETs based on the obtained multilayer heterostructures in a static regime exhibit working current densities up to 0.6 A/mm at a transconductance of up to 150 mS/mm and a breakdown voltage above 100 V.
Databáze: OpenAIRE