Swelling and sputtering of porous germanium by silver ions
| Autor: | Andrii Rogov, Lenar Tagirov, Amir Gumarov, Andrey L. Stepanov |
|---|---|
| Rok vydání: | 2019 |
| Předmět: |
Materials science
Polymers and Plastics Scanning electron microscope Analytical chemistry chemistry.chemical_element Germanium 02 engineering and technology 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences 0104 chemical sciences Ion Germanide chemistry.chemical_compound chemistry X-ray photoelectron spectroscopy Mechanics of Materials Sputtering Materials Chemistry Ceramics and Composites medicine Swelling medicine.symptom 0210 nano-technology Current density |
| Zdroj: | Composites Communications. 16:57-60 |
| ISSN: | 2452-2139 |
| Popis: | Surface processes for porous Ge (PGe) formed by low-energy high-dose implantation of Ag+ with an energy of E = 30 keV and a current density J = 5 μA/cm2 in dependence of the radiation dose D = 6.2·1014–1.5·1017 ion/cm2 where observed. Using X-ray photoelectron spectroscopy, it was found that for selected implantation conditions at D ≥ 9.3·1015 ion/cm2, Ag nanoparticles were synthesized in Ge, but formation of silver germanide (GeAg4) was not occur. Using scanning electron and atomic-force microscopy it was found that with increasing D up to ~1.9 × 1016 ion/cm2 , a layer of porous germanium (Ag:PGe) is formed, accompanied by swelling of the implanted Ge surface up to 25 nm thick. With a further increase of D > 1.9·1016 ion/cm2, the opposite effect is observed, which consists of sputtering PGe at a constant rate of ~3.6 nm/min and an sputtering yield of ~17.2. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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