Study on polishing slurry waste reduction in polishing monocrystalline silicon based on ultrasonic atomization

Autor: Yu Zhao, Tianbiao Yu, Tianqi Zhang, Jiashun Shi, Yu Tao, Ji Zhao
Rok vydání: 2019
Předmět:
Zdroj: Journal of Cleaner Production. 233:1-12
ISSN: 0959-6526
Popis: It is found that in order to ensure the polishing slurry involved in polishing process is sufficient, the supply of polishing slurry has to be excessive in conventional polishing process. However, actually only a limited amount of polishing slurry is involved in polishing process compared with the supplied polishing slurry, and the overwhelming majority is directly discharged which increases waste emissions. On the other hand, the issue of industrial waste is increasingly attracting scientific and public attention due to the magnitude of the problem in China, and various types of polishing slurries will cause serious pollution to rivers and soils. This paper focuses on a novel and successful polishing slurry waste reduction method which realizes waste reduction on the premise of ensuring the polishing performance. The proposed method is based on ultrasonic atomization, which can make the polishing slurry with low supply rate form a soft and low velocity fine mist spray and realize the even distribution of abrasive particles in slurry, and is called ultrasonic atomization polishing. In order to prove the feasibility of this waste reduction method, this paper has proved that (i) the introduction of ultrasonic atomization contributes the improvement of surface quality and polishing efficiency and (ii) ultrasonic atomization polishing can greatly realize polishing slurry waste reduction, moreover, multi-objective optimization scheme of polishing parameters for ultrasonic atomization polishing is obtained, which are all of great significance to guide the waste reduction in actual production.
Databáze: OpenAIRE