Plasma Texturing of Silicon Wafers and Finished Solar Cell for Mass Production
| Autor: | Dominik Lausch, Norbert Bernhard, Jens Hirscha |
|---|---|
| Rok vydání: | 2018 |
| Předmět: |
010302 applied physics
Materials science Silicon Passivation business.industry chemistry.chemical_element 02 engineering and technology Plasma 021001 nanoscience & nanotechnology 01 natural sciences Ion law.invention chemistry law 0103 physical sciences Solar cell Optoelectronics Wafer Current (fluid) 0210 nano-technology business Layer (electronics) |
| Zdroj: | 2018 IEEE 7th World Conference on Photovoltaic Energy Conversion (WCPEC) (A Joint Conference of 45th IEEE PVSC, 28th PVSEC & 34th EU PVSEC). |
| DOI: | 10.1109/pvsc.2018.8547438 |
| Popis: | Standard plasma texturing of silicon wafers are not widely introduced within mass production due to several challenges which have to be overcome before implementation i.e. surface contamination, surface near damaging due to ion bombardment, and surface passivation. Within this contribution we will show our current status to overcome these challenges. We will present that the electrical and optical properties of ICP only plasma textured samples are sufficient for solar cell production. Since in ICP processes the ion bombardment is low we also will discuss our current understanding of the plasma process based on experimental results of the self-masking process. Furthermore, a new plasma texturing approach texturing the SiN layer of finished solar cells is introduced for the first time which overcome all problems introduced by the plasma texturing of bare solar wafers. |
| Databáze: | OpenAIRE |
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