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Mass resolution is a common and fairly easy-to-measure quantity in ion implantation. The interpretation of mass spectra and the calculated mass resolution ( M /Δ M ), however, is not always straightforward. The effect of mass resolution on important equipment and process issues such as AMU (mass) tuning, beam current and energetic (implanted) contamination can also be complicated and sometimes counterintuitive. The contributions of isotopic content, mass resolving aperture width, and beam width at the resolving aperture to measured mass resolution are explored analytically. The interactions between these parameters and their effects on AMU tuning, beam current, and energetic contamination are modeled for several useful and interesting cases. Methods are described for measuring the important quantities in mass resolution. |
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