Thickness dependence of the LUMO position for phthalocyanines on hydrogen passivated silicon (111)
| Autor: | W. Michaelis, Dietrich R. T. Zahn, M. Gorgoi, Thorsten U. Kampen, Derck Schlettwein |
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| Rok vydání: | 2004 |
| Předmět: |
Chemistry
Photoemission spectroscopy Inverse photoemission spectroscopy Fermi level Analytical chemistry General Physics and Astronomy Surfaces and Interfaces General Chemistry Condensed Matter Physics Semimetal Surfaces Coatings and Films symbols.namesake chemistry.chemical_compound Monolayer symbols Phthalocyanine Spectroscopy HOMO/LUMO |
| Zdroj: | Applied Surface Science. 234:138-143 |
| ISSN: | 0169-4332 |
| DOI: | 10.1016/j.apsusc.2004.05.065 |
| Popis: | Inverse photoemission spectroscopy (IPES) was employed to study the density of unoccupied electronic states of fluorinated and non-fluorinated cooper phthalocyanine layers deposited onto hydrogen passivated Si(1 1 1) substrates. For the non-fluorinated cooper phthalocyanine (CuPc) the lowest unoccupied molecular orbital (LUMO) is found to shift gradually towards the Fermi level with increasing film thickness. The shift amounts to 400 meV and appears for film thicknesses between one monolayer and 10 nm. This finding complements previous results obtained using ultraviolet photoemission spectroscopy where the highest occupied molecular orbital (HOMO) was found to shift as a function of film thickness. Fluorinated cooper phthalocyanine (F 16 CuPc) shows the opposite behaviour, that is the distance between LUMO and Fermi level is increasing by 1.2 eV. |
| Databáze: | OpenAIRE |
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