Uptake of Copper Acetamidinate ALD Precursors on Nickel Surfaces
| Autor: | Roy G. Gordon, Francisco Zaera, Qiang Ma, Hansheng Guo |
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| Rok vydání: | 2009 |
| Předmět: | |
| Zdroj: | Chemistry of Materials. 22:352-359 |
| ISSN: | 1520-5002 0897-4756 |
| DOI: | 10.1021/cm9027447 |
| Popis: | The adsorption and thermal activation of copper(I)-N,N′-di-sec-butylacetamidinate on a Ni(110) single-crystal surface were characterized in connection with the use of that compound as a precursor for the growth of copper films via atomic layer deposition (ALD) processes. Studies were carried out under ultrahigh vacuum (UHV) conditions by using a combination of X-ray photoelectron spectroscopy (XPS), low-energy ion scattering (LEIS), and temperature-programmed desorption (TPD). A temperature window between approximately 350 and 450 K was identified for the clean deposition of the precursor on the surface: lower temperatures are insufficient for activation of the dissociative adsorption, and higher temperatures lead to continuous decomposition beyond Cu monolayer saturation. Approximately three ALD-like cycles are required to reach full Cu monolayer saturation, the equivalent of a film growth rate of approximately 0.75 A/cycle. Preadsorption of hydrogen on the surface does not modify any of this behavior be... |
| Databáze: | OpenAIRE |
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