Auger and photoelectron line energy relationships in aluminum–oxygen and silicon–oxygen compounds

Autor: H. A. Six, C. D. Wagner, T. G. Kinisky, H. F. Hillery, D. E. Passoja, J. A. Taylor, W. T. Jansen
Rok vydání: 1982
Předmět:
Zdroj: Journal of Vacuum Science and Technology. 21:933-944
ISSN: 0022-5355
DOI: 10.1116/1.571870
Popis: Silicon–oxygen and aluminum–oxygen compounds exhibit significant XPS Auger and photoelectron chemical shifts that are accurately measurable. Chemical state plots of KLL Auger kinetic energy versus 2p photoelectron energy permit identification of chemical species from the locations of their points on the plots. The KLL Auger electrons of Al and Si were generated by the bremsstrahlung component of the radiation, with conventional instrumentation. The location of points on the plots can be understood on the basis of polarizability of the environment (on the Auger parameter grid of lines, slope +1) and on the basis of the factors contributing to the energy of the final state ion in the Auger transition (a grid of line, slope −1). Tetrahedral aluminum has a significantly smaller Auger parameter than octahedral aluminum, and this difference is repeated, but with reduced magnitude on the similar plots for silicon and oxygen lines for the same compounds. Otherwise, the Auger parameters for this class of compounds...
Databáze: OpenAIRE