Plasma Immersion Ion Implantation of Nitrogen into Porous Silicon Layers

Autor:	A. Grosman, I. Pintér, C. Ortega, G. Amsel, Edit Szilágyi, Gábor Battistig, A. Manuaba
Rok vydání:	1997
Předmět:	Materials science Ion implantation Ion beam analysis Chemical engineering chemistry Mechanics of Materials Mechanical Engineering chemistry.chemical_element General Materials Science Condensed Matter Physics Porous silicon Plasma-immersion ion implantation Nitrogen
Zdroj:	Materials Science Forum. :233-236
ISSN:	1662-9752
DOI:	10.4028/www.scientific.net/msf.248-249.233
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::e7c93cebb1c494034bb791acaae34952 https://doi.org/10.4028/www.scientific.net/msf.248-249.233 Zobrazit plný text záznamu