Processing advances in transparent Foturan® MEMS

Autor:	D. Serkland, John D. Williams, Carrie Schmidt
Rok vydání:	2010
Předmět:	Microelectromechanical systems Distributed feedback laser Materials science business.industry General Chemistry Surface finish Photosensitive glass Isotropic etching Aspect ratio (image) law.invention Optics Optical microscope law Optoelectronics General Materials Science business Lithography
Zdroj:	Applied Physics A. 99:777-782
ISSN:	1432-0630 0947-8396
DOI:	10.1007/s00339-010-5721-1
Popis:	A lithographic patterning process for Foturan® is demonstrated that optimizes the aspect ratio and side-wall roughness and eliminates all traces of white redeposit on the side walls. The structures may then be run through a post-etch anneal to further reduce side-wall roughness to approximately 4 nm. Thermal fusion bonding during the post-etch anneal allows for the production of three-dimensional structures. Finally, we report the optical properties of patterned Foturan® microstructures observed using a 780-nm distributed feedback laser.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::e7a25e25695bb357b768affac9dbf225 https://doi.org/10.1007/s00339-010-5721-1 Zobrazit plný text záznamu Plný text ve formátu PDF