Numerical Modeling of Floating Electrodes in a Plasma Processing System
| Autor: | Junghoon Joo |
|---|---|
| Rok vydání: | 2015 |
| Předmět: |
Chemistry
business.industry Materials Science (miscellaneous) Analytical chemistry CFD-ACE+ General Medicine Plasma Dielectric Mechanics Computational fluid dynamics Condensed Matter Physics Physics::Plasma Physics Electric field Capacitively coupled plasma Electric potential Electrical and Electronic Engineering Physical and Theoretical Chemistry business Plasma processing |
| Zdroj: | Applied Science and Convergence Technology. 24:102-110 |
| ISSN: | 2288-6559 |
| Popis: | Fluid model based numerical analysis is done to simulate a plasma processing system with electrodes at floating potential. Vf is a function of electron temperature, electron mass and ion mass. Commercial plasma fluid simulation softwares do not provide options for floating electrode boundary value condition. We developed a user subroutine in CFD?ACE+ and compared four different cases: grounded, dielectric, zero normal electric field and floating electric potential for a 2D?CCP (capacitively coupled plasma) with a ring electrode. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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