Autor: |
Dennis Lin, X. Zhou, Jerome Mitard, Quentin Smets, S. Ramesh, Anne S. Verhulst, Ts. Ivanov, Niamh Waldron, S. Sioncke, Hiroaki Arimura, M. Schaekers, Nadine Collaert, Jacopo Franco, Rita Rooyackers, A. Sibaya-Hernandez, Anne Vandooren, Liesbeth Witters, A. Vais, A. Alian, G. Boccardi, Geert Eneman, Devin Verreck, Anabela Veloso, Hao Yu, A. Walke, Aaron Thean |
Rok vydání: |
2016 |
Předmět: |
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Zdroj: |
ICICDT |
DOI: |
10.1109/icicdt.2016.7542050 |
Popis: |
In this work, we will review the current progress in high mobility devices and new device architectures. With main focus on (Si)Ge for pMOS and In(Ga)As for nMOS, the benefits and challenges of integrating these materials on a Si platform will be discussed. Next to that, the advantages of tunnel FETs, vertical logic and in general heterogeneous integration will be highlighted. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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