Nanoimprint glass-like carbon molds fabricated with ECR oxygen ion beams using polysiloxane oxide mask
| Autor: | Shuji Kiyohara, Yukiko Omata, Y. Sugiyama, S. Araki, Yuichi Kurashima, Yoshio Taguchi |
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| Rok vydání: | 2010 |
| Předmět: |
Materials science
Ion beam Oxide Nanotechnology Condensed Matter Physics Atomic and Molecular Physics and Optics Electron cyclotron resonance Electronic Optical and Magnetic Materials Nanoimprint lithography law.invention chemistry.chemical_compound Nanolithography chemistry Resist law Cathode ray Electrical and Electronic Engineering Composite material Beam (structure) |
| Zdroj: | Journal of Materials Science: Materials in Electronics. 22:183-188 |
| ISSN: | 1573-482X 0957-4522 |
| Popis: | We have investigated the nanofabrication for glass-like carbon molds with electron cyclotron resonance oxygen ion beam etching technologies using polysiloxane [-R2SiO-]n as an electron beam mask and a room-temperature imprint resist material. The maximum etching selectivity of polysiloxane film against glass-like carbon was 27, which was obtained with ion energy of 400 eV. It was found that the optimum etching time to fabricate dots of 500 nm in height was 5 min, which was explored according to the computer simulation. The glass-like carbon molds with square pole and cylinder dots were fabricated with 500 nm in width and diameter, respectively. The optimum imprinting pressure and its depth obtained after the press for 5 min were 0.5 MPa and 0.5 μm, respectively. We carried out the room-temperature nanoimprint lithography process using glass-like carbon molds. The resulting width of imprinted polysiloxane patterns was obtained in good agreement with that of the mold. |
| Databáze: | OpenAIRE |
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