| Autor: |
Benaiah D. Schrag, Xiaoyong Liu, Jan S. Hoftun, Peter L. Klinger, T.M. Levin, David P. Vallett |
| Rok vydání: |
2005 |
| Předmět: |
|
| Zdroj: |
EDFA Technical Articles. 7:24-31 |
| ISSN: |
1537-0755 |
| DOI: |
10.31399/asm.edfa.2005-4.p024 |
| Popis: |
Magnetic field imaging is proving to be a valuable tool for semiconductor failure analysts and test engineers. One of its main advantages is that it does not require sample preparation or deprocessing because magnetic fields pass through most materials used in ICs and device packages. This article discusses the theory and practical limitations of magnetic field imaging and demonstrates its use in mapping current density and determining the location and depth of current-carrying conductors. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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