THE STUDY OF ATMOSPHERIC PRESSURE PLASMA BY CAPILLARY DIELECTRIC COVERED ELECTRODE AND ITS APPLICATION TO PHOTORESIST ETCHING AND SURFACE CLEANING
Autor: | Y. H. Lee, C. H. Yi, G. Y. Yeom |
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Rok vydání: | 2023 |
Zdroj: | Proceeding of Progress in Plasma Processing of Materials, 2003. |
Databáze: | OpenAIRE |
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