THE STUDY OF ATMOSPHERIC PRESSURE PLASMA BY CAPILLARY DIELECTRIC COVERED ELECTRODE AND ITS APPLICATION TO PHOTORESIST ETCHING AND SURFACE CLEANING

Autor: Y. H. Lee, C. H. Yi, G. Y. Yeom
Rok vydání: 2023
Zdroj: Proceeding of Progress in Plasma Processing of Materials, 2003.
Databáze: OpenAIRE