Defect dispositioning using mask printability on attenuated phase-shift production photomasks

Autor:	Anja Rosenbusch, Alex Goldenshtein, Benjamin George Eynon, Justin W. Novak
Rok vydání:	2001
Předmět:	Materials science business.industry Mask inspection Substrate (printing) Image capture law.invention Optics law Phase-shift mask Wafer Photomask Photolithography business Aerial image
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
Popis:	This paper examines the effects of mask printability of various OPC defect types on a MoSi APSM mask using an MSM-100 AIMS tool operating at 248nm as a printability prediction tool. Printability analysis will be used to address differences in intensity, image capture wavelength, defocus, defect size, type, and placement on two substrate materials. Defect correlation to photomask CD error, aerial image intensity error, and MEEF on high-end KrF photomasks will also be studied.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::e72f14c9ef071684e6c21813301dacbd https://doi.org/10.1117/12.438407 Zobrazit plný text záznamu