Predicting future complementary metal–oxide–semiconductor technology – challenges and approaches
| Autor: | Vikas Chandra, Greg Yeric, David Victor Pietromonaco, Brian Cline, Saurabh Sinha, Shidhartha Das, Robert Campbell Aitken, Lucian Shifren |
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| Rok vydání: | 2016 |
| Předmět: |
010302 applied physics
Engineering CPU power dissipation business.industry Process (engineering) 020208 electrical & electronic engineering 02 engineering and technology 01 natural sciences Microarchitecture Access to information CMOS Hardware and Architecture Embedded system 0103 physical sciences Design exploration 0202 electrical engineering electronic engineering information engineering Systems engineering Place and route Electrical and Electronic Engineering business Software Mutual influence |
| Zdroj: | IET Computers & Digital Techniques. 10:315-322 |
| ISSN: | 1751-861X 1751-8601 |
| Popis: | Long timescales and complex design processes require that CPU architects and microarchitects have early access to information about future manufacturing processes. In some cases, this means that future technology must be predicted in advance of it actually being developed. In addition, close collaboration with the foundries, known as ‘Design-Technology Co-Optimisation’, or DTCO, allows the mutual influence during development of microarchitecture, physical IP (standard cells and memories), and process technology. This predictive technology, in conjunction with early technology information or not, allow design exploration in the form of trial runs of synthesis, place and route to determine the predicted effects of various technology choices on CPU power, performance, and area. |
| Databáze: | OpenAIRE |
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