Selective Area Crystallization of Amorphous Silicon using a Micro Patterned SiO2 Capping Layer
| Autor: | Do Kyung Kim, Woong Hee Jeong, Tae Hyung Hwang, Nam Seok Roh, Hyun Jae Kim |
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| Rok vydání: | 2009 |
| Zdroj: | ECS Meeting Abstracts. :767-767 |
| ISSN: | 2151-2043 |
| DOI: | 10.1149/ma2009-01/18/767 |
| Popis: | not Available. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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