Large‐area pulsed laser deposition: Techniques and applications
| Autor: | James A. Greer, M. D. Tabat |
|---|---|
| Rok vydání: | 1995 |
| Předmět: |
Materials science
Deposition (phase transition) Nanotechnology Surfaces and Interfaces Chemical vapor deposition Sputter deposition Thin film Combustion chemical vapor deposition Condensed Matter Physics Evaporation (deposition) Surfaces Coatings and Films Pulsed laser deposition Molecular beam epitaxy |
| Zdroj: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 13:1175-1181 |
| ISSN: | 1520-8559 0734-2101 |
| DOI: | 10.1116/1.579857 |
| Popis: | Pulsed laser deposition (PLD) has quickly emerged as a unique tool with which to grow high quality films of complex chemical compounds. It is estimated that at present the number of different materials which have been deposited by PLD now exceeds two hundred. Scientists have used this process primarily as a laboratory tool to deposit films of various compounds that are typically difficult to synthesize by other techniques, and then quickly evaluate the relevant material properties. Deposition techniques such as ion‐beam, rf, or dc magnetron sputtering, electron‐beam evaporation, molecular beam epitaxy, chemical vapor deposition, and metal organic chemical vapor deposition, have all achieved wide‐spread acceptance as processes with which to grow various types of electronic and optical films. In order for PLD to emerge as a real production process, it must be demonstrated that PLD is capable of depositing material over useful substrate sizes with acceptable uniformity. PLD must also compete with more establ... |
| Databáze: | OpenAIRE |
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