Phenomenological modeling of low-bias sulfur hexafluoride plasma etching of silicon

Autor:	Luiz Felipe Aguinsky, Frâncio Rodrigues, Georg Wachter, Michael Trupke, Ulrich Schmid, Andreas Hössinger, Josef Weinbub
Rok vydání:	2022
Předmět:	Materials Chemistry Electrical and Electronic Engineering Condensed Matter Physics Electronic Optical and Magnetic Materials
Zdroj:	Solid-State Electronics. 191:108262
ISSN:	0038-1101
DOI:	10.1016/j.sse.2022.108262
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::e65f7b11fb388ebe3c9bc85326e0889a https://doi.org/10.1016/j.sse.2022.108262 Zobrazit plný text záznamu Full Text from ScienceDirect