A LASER INTERFEROMETER FOR MONITORING THIN FILM PROCESSES: APPLICATION TO POLYMER DISSOLUTION

Autor:	R. J. Groele, P. D. Krasicky, Ferdinand Rodriguez
Rok vydání:	1987
Předmět:	Materials science business.industry General Chemical Engineering General Chemistry Laser Poly(methyl methacrylate) law.invention Interferometry Optics law visual_art visual_art.visual_art_medium Microelectronics Light beam Wafer Thin film business Refractive index
Zdroj:	Chemical Engineering Communications. 54:279-299
ISSN:	1563-5201 0098-6445
DOI:	10.1080/00986448708911911
Popis:	An instrument has been assembled which is well suited for monitoring changes in transparent films and coatings where the thickness ranges from several μm down to fractions of a μm. The operation is based on thin film optical interferometry. Applications include measurement of the dissolution rate in selected organic solvents of a 2-μm thick film of poly(methyl methacrylate) (PMMA) which has been coated on a silicon-oxide-surfaced silicon wafer. Such measurements are often required in developing images from electron-beam or X-ray exposure in microlithography and microelectronics. An unpolarized light beam from a 2 mW He-Ne laser is directed obliquely onto the surface of the film. From the time dependence of the intensity of reflected light, both the rate of dissolution and the refractive index of the film can be ascertained. A review of the optical theory upon which such measurements are based is included. The scope of additional information obtainable through application of this technique, includ...
Databáze:	OpenAIRE
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