Recent progress in cell-projection electron-beam lithography
| Autor: | Hiroya Ohta, Hajime Kawano, Hiroyuki Itoh, Hidetoshi Satoh, Jiro Yamamoto, Yasunari Sohda, Fumio Murai |
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| Rok vydání: | 2003 |
| Předmět: |
Materials science
business.industry Computational lithography Extreme ultraviolet lithography Condensed Matter Physics Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Optics Resist law Stencil lithography Electrical and Electronic Engineering Photolithography business Lithography Next-generation lithography Maskless lithography |
| Zdroj: | Microelectronic Engineering. :78-86 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/s0167-9317(03)00062-5 |
| Popis: | This paper reviews and introduces recent methods for enhancing the performance of cell-projection lithography and describes various useful applications of this type of lithography. To increase the throughput, the area of the e-beam mask that is available for cell apertures was four-times increased. For enhanced lithographic resolution, the resolution in cell-beam measurement was enhanced. The method that uses transmitted electrons through a very fine hole in the stencil was improved. Much higher resolution is achieved compared as before. Moreover, several applications of cell-projection lithography were demonstrated to show its advantages. They included lithography in the fabrication of photo-masks and magnetic head devices those use plural cell apertures. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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