Autor: |
Mitch M.C. Chou, Chuck W.C. Hsu, Chenlong Chen, Calvin Liu, Chu-An Li, Jin-Wei Lu |
Rok vydání: |
2011 |
Předmět: |
|
Zdroj: |
Journal of Crystal Growth. 316:6-9 |
ISSN: |
0022-0248 |
DOI: |
10.1016/j.jcrysgro.2010.11.160 |
Popis: |
A newly designed two-step reactor which places both chemical vapor deposition (CVD) and hydride vapor phase epitaxy (HVPE) in series is proposed to grow nonpolar m -plane GaN (1 0 −1 0) material on a closely lattice-matched (1 0 0) LiAlO 2 single crystal substrate. The surface morphologies are characterized by scanning electron microscopy. Structural properties of the GaN epilayers are investigated by X-ray diffraction, and the FWHM of GaN (1 0 −1 0) rocking curve is around 0.13°. Optical and electrical properties are evaluated by photoluminescence spectroscopy, optical transmission spectra and Hall measurement. Photoluminescence spectroscopy exhibited a near band edge emission peak at 3.410 eV. The carrier concentration is (3.9±0.01)×10 18 cm −3 . |
Databáze: |
OpenAIRE |
Externí odkaz: |
|