Cold plasma − A promising tool for the production of thin-film nanocatalysts
| Autor: | Jan Sielski, Jacek Tyczkowski, Ryszard Kapica, Jacek Balcerzak, Hanna Kierzkowska-Pawlak |
|---|---|
| Rok vydání: | 2019 |
| Předmět: |
Materials science
New materials Nanotechnology 02 engineering and technology General Chemistry Plasma 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences Catalysis Nanomaterial-based catalyst 0104 chemical sciences Plasma-enhanced chemical vapor deposition Thin film 0210 nano-technology |
| Zdroj: | Catalysis Today. 337:44-54 |
| ISSN: | 0920-5861 |
| DOI: | 10.1016/j.cattod.2019.03.037 |
| Popis: | The plasma enhanced chemical vapor deposition (PECVD) method has turned out to be an excellent technique for creating new materials with unique properties that are not obtainable by any other methods. A special place is occupied by materials in the form of very thin films ( |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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