Threshold Energy Resist Model for Critical Dimension Prediction

Autor:	Young-Keun Kwon, Jun-Taek Park, Ilsin An, Ji-Yong Yoo, Hye-Keun Oh, Woo-Sung Han, Dong-Soo Sohn
Rok vydání:	2003
Předmět:	Physics and Astronomy (miscellaneous) Computer science General Engineering Process (computing) General Physics and Astronomy Linearity Threshold energy law.invention Resist law Photolithography Critical dimension Algorithm Intensity (heat transfer) Aerial image
Zdroj:	Japanese Journal of Applied Physics. 42:3905-3907
ISSN:	1347-4065 0021-4922
Popis:	The threshold energy resist model based on the aerial image is less time consuming and sometimes more efficient than the full simulation model based on mathematical analysis of the whole complicated photolithography process. Moreover, this model still contains a disadvantage that its prediction is limited in various situations. In this paper, we report the new threshold resist model to predict the critical dimension (CD) on the wafer is presented. This model has a functional form that is consisted of the aerial image intensity and its slope. The contours of a resist pattern are determined from the aerial image contours of the process matched by using a functional form. High prediction accuracy in various patterns with respect to pattern sizes is obtained by using the new model.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::e5a3e94711154ae3009c100f51ffa7a7 https://doi.org/10.1143/jjap.42.3905 Zobrazit plný text záznamu