Evaluation results for the positive deep-UV resist AZ DX 46

Autor:	Francoise Vinet, Takanori Kudo, Horst Wengenroth, Natusmi Suehiro, Charles Le Cornec, Yoshiaki Kinoshita, Thomas J. Lynch, Seiya Masuda, Thierry Mourier, Yuko Nozaki, Horst Roeschert, John Kochan, Munirathna Padmanaban, Klaus Juergen Przybilla, Hiroshi Okazaki, Gary C. Escher, Georg Pawlowski, Setha G. Olson, Walter Spiess
Rok vydání:	1994
Předmět:	Excimer laser business.industry medicine.medical_treatment Krypton chemistry.chemical_element Laser law.invention Absorbance Optics Resist chemistry law medicine Stepper Photomask business Lithography
Zdroj:	Advances in Resist Technology and Processing XI.
ISSN:	0277-786X
DOI:	10.1117/12.175402
Popis:	This contribution emphasizes resist application site by communicating lithographic results for AZ DX 46, obtained using the GCA XLS 7800/31 stepper, NA equals 0.53, equipped with krypton fluoride excimer laser ((lambda) equals 248 nm), model 4500 D, as exposure source, delivered by Cymer Laser Technologies. As far as delay time experiments are concerned ASM-L PAS 5500/70 stepper, NA equals 0.42, was used in combination with Lambda Physik excimer laser, model 248 L.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::e583d9070ea75e2d3083b2e0cd146a61 https://doi.org/10.1117/12.175402 Zobrazit plný text záznamu